VLSI technology / edited by S.M. Sze.

Contributor(s): Sze, S. M, 1936-Series: McGraw-Hill series in electrical engineeringPublisher: New York : McGraw-Hill, c1988Edition: 2nd edDescription: xii, 676 p. : ill. ; 25 cmISBN: 0070627355 :Subject(s): Integrated circuits -- Very large scale integrationDDC classification: 621.395.VLS Online resources: Publisher description | Table of contents
Contents:
Crystal Growth and Wafer Preparation (Page-9), Epitaxy (Page-55), Oxidation (Page-98), Lithography (Page-141), Reactive Plasma Etching (Page-184), Dielectric and Polysilicon Film Deposition (Page-233) Diffusion (Page-272), Ion Implantation (Page-327), Metallization (Page-375), Process Simulation (Page-422), VLSI Process Integration (Page-466), Analytical Techniques (Page-516), Assembly Techniques and Packaging of VLSI Devices (Page-566), Yield and Reliability (Page-612).
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Item type Current location Home library Shelving location Call number URL Status Notes Date due Barcode Item holds
Book Book Military College of Signals (MCS)
Military College of Signals (MCS)
General Stacks 621.395,VLS (Browse shelf) Link to resource Available Almirah No.40, Shelf No.4 MCS32657
Book Book Military College of Signals (MCS)
Military College of Signals (MCS)
General Stacks 621.395,VLS (Browse shelf) Link to resource Available Almirah No.40, Shelf No.4 MCS764
Total holds: 0

Crystal Growth and Wafer Preparation (Page-9), Epitaxy (Page-55), Oxidation (Page-98), Lithography (Page-141), Reactive Plasma Etching (Page-184), Dielectric and Polysilicon Film Deposition (Page-233) Diffusion (Page-272), Ion Implantation (Page-327), Metallization (Page-375), Process Simulation (Page-422), VLSI Process Integration (Page-466), Analytical Techniques (Page-516), Assembly Techniques and Packaging of VLSI Devices (Page-566), Yield and Reliability (Page-612).

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