Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg.
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TextPublisher: Hoboken, N.J. : Wiley-Interscience, c2005Edition: 2nd edDescription: xxxv, 757 p. : ill. ; 25 cmISBN: 0471720011 Subject(s): Plasma dynamics | Thin films -- Surfaces | Plasma etching | Plasma chemistry -- Industrial applicationsDDC classification: 530.44 LOC classification: QC718.5.D9 | L54 2005Online resources: Contributor biographical information | Publisher description | Table of contents only Dissertation note: .
| Item type | Current location | Home library | Collection | Call number | Copy number | Status | Date due | Barcode | Item holds |
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US-Pakistan Center for Advanced Studies in Energy (USPCAS-E) | US-Pakistan Center for Advanced Studies in Energy (USPCAS-E) | NFIC | 530.44 LIE-P 2005 (Browse shelf) | Available | CAS-E0001259 | |||
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Book
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US-Pakistan Center for Advanced Studies in Energy (USPCAS-E) | US-Pakistan Center for Advanced Studies in Energy (USPCAS-E) | NFIC | 530.44 LIE-P 2005 (Browse shelf) | C-2 | Available | CAS-E0001260 | ||
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Book
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US-Pakistan Center for Advanced Studies in Energy (USPCAS-E) | US-Pakistan Center for Advanced Studies in Energy (USPCAS-E) | NFIC | 530.44 LIE-P 2005 (Browse shelf) | C-3 | Available | CAS-E0001261 |
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| 530.1595 REI-M 2009 A modern course in statistical physics / | 530.41 HUM-E 2011 Electronic properties of materials | 530.41 HUM-E 2011 Electronic properties of materials | 530.44 LIE-P 2005 Principles of plasma discharges and materials processing / | 530.44 LIE-P 2005 Principles of plasma discharges and materials processing / | 530.44 LIE-P 2005 Principles of plasma discharges and materials processing / | 530.44 OKS-P 2006 Plasma cathode electron sources : |
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Includes bibliographical references (p. 735-748) and index.
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