silicon and gallium arsenide Ghandhi, Sorab Khushro creator New York Wiley c1983 xi, 665 p. : ill. ; 24 cm. Material Properties (Page-1), Phase Diagrams and Solid Solubility (Page-49), Crystal Growth and Doping (Page-81), Diffusion (Page-111), Epitaxy (Page-213), Ion Implantation (Page-299), Native Oxide Films (Page-371), Deposits Films (Page-419), Etching and Cleaning (Page-475), Lithographic Processes (Page-533), Device and Circuits Fabrication (Page-567), The Mathematics of Diffusion (Page-639). Sorab K. Ghandhi. Gallium arsenide Silicon Telecommunication Engineering 621.38171,GHA 0471868337 : 82010842 http://www.loc.gov/catdir/enhancements/fy0607/82010842-d.html http://www.loc.gov/catdir/enhancements/fy0607/82010842-t.html http://www.loc.gov/catdir/enhancements/fy0607/82010842-d.html http://www.loc.gov/catdir/enhancements/fy0607/82010842-t.html 20221201131137.0