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  <titleInfo>
    <title>Handbook of physical vapor deposition (PVD) processing</title>
  </titleInfo>
  <titleInfo type="abbreviated">
    <title>Handbook of physical vapor deposition (PVD) processing</title>
  </titleInfo>
  <name type="personal">
    <namePart>Mattox, D. M.</namePart>
    <role>
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  <name type="corporate">
    <namePart>ebrary, Inc</namePart>
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  <typeOfResource>text</typeOfResource>
  <genre authority="marc">bibliography</genre>
  <genre authority="local">Electronic books.</genre>
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    <place>
      <placeTerm type="text">Amsterdam</placeTerm>
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    <publisher>Elsevier</publisher>
    <dateIssued>2010</dateIssued>
    <edition>2nd ed.</edition>
    <issuance>monographic</issuance>
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  <language>
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  <note type="statement of responsibility">Donald M. Mattox.</note>
  <note>.</note>
  <note>Includes bibliographical references and index.</note>
  <note>License restrictions may limit access.</note>
  <subject authority="lcsh">
    <topic>Physical vapor deposition</topic>
    <topic>Handbooks, manuals, etc</topic>
  </subject>
  <classification authority="lcc">TS695 .M38 2010eb</classification>
  <classification authority="lcc">TS695</classification>
  <classification authority="ddc" edition="22">671.735 MAT-H 2010</classification>
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      <title>eBook - Materials Science 2010 [EBCMS10]</title>
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  <identifier type="isbn">9780080946580 </identifier>
  <identifier type="uri">http://www.columbia.edu/cgi-bin/cul/resolve?clio8569414</identifier>
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