01577cam a2200385 a 4500 13749338 USPCAS-E 20180118181421.0 041013s2005 njua b 001 0 eng 2004058503 0471720011 (OCoLC)ocm56752658 DLC DLC IAY C#P OCL IXA BAKER DLC QC718.5.D9 L54 2005 530.44 22 LIE-P 2005 Lieberman, M. A. (Michael A.) Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg. 2nd ed. Hoboken, N.J. : Wiley-Interscience, c2005. xxxv, 757 p. : ill. ; 25 cm. . Includes bibliographical references (p. 735-748) and index. Plasma dynamics. Thin films Surfaces. Plasma etching. Plasma chemistry Industrial applications. Lichtenberg, Allan J. Contributor biographical information http://www.loc.gov/catdir/enhancements/fy0618/2004058503-b.html Publisher description http://www.loc.gov/catdir/enhancements/fy0618/2004058503-d.html Table of contents only http://www.loc.gov/catdir/enhancements/fy0618/2004058503-t.html 7 cbc orignew 1 ocip 20 y-gencatlg ddc BK 356039 356039 0 0 ddc 0 0 NFIC CAS-E CAS-E DISPLAY 2016-02-08 Golden books 14013.00 0 530.44 LIE-P 2005 CAS-E0001259 2016-02-08 2016-02-08 BK 0 0 ddc 0 0 NFIC CAS-E CAS-E DISPLAY 2016-02-08 Golden books 14013.00 1 530.44 LIE-P 2005 CAS-E0001260 2024-09-30 2024-01-15 C-2 2016-02-08 BK 0 0 ddc 0 0 NFIC CAS-E CAS-E DISPLAY 2016-02-08 Golden books 14013.00 0 530.44 LIE-P 2005 CAS-E0001261 2016-02-08 C-3 2016-02-08 BK