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     <title><![CDATA[NUST Institutions Library Catalogue Search for '(su:&quot;Thin films&quot;) AND (su:&quot;Surfaces.&quot;)']]></title>
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     <description><![CDATA[ Search results for '(su:&quot;Thin films&quot;) AND (su:&quot;Surfaces.&quot;)' at NUST Institutions Library Catalogue]]></description>
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       <title>
    Wafer Level 3-D ICs Process Technology (E-BOOK)






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       <dc:identifier>ISBN:978-0-387-76534-1</dc:identifier>
        
        <link>http://catalogue.nust.edu.pk:8081/cgi-bin/koha/opac-detail.pl?biblionumber=192890</link>
        
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	   <p>By Tan, Chuan Seng.. 
	   Boston, MA : Springer US, 2008
                        
                        
                        
                         978-0-387-76534-1
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<p><a href="http://catalogue.nust.edu.pk:8081/cgi-bin/koha/opac-reserve.pl?biblionumber=192890">Place Hold on <em>Wafer Level 3-D ICs Process Technology (E-BOOK)</em></a></p>

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    Principles of plasma discharges and materials processing /






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       <dc:identifier>ISBN:0471720011 </dc:identifier>
        
        <link>http://catalogue.nust.edu.pk:8081/cgi-bin/koha/opac-detail.pl?biblionumber=356039</link>
        
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	   <p>By Lieberman, M. A.. 
	   Hoboken, N.J. : Wiley-Interscience, 2005
                        . xxxv, 757 p. :
                        
                         25 cm.. 
                         0471720011 
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<p><a href="http://catalogue.nust.edu.pk:8081/cgi-bin/koha/opac-reserve.pl?biblionumber=356039">Place Hold on <em>Principles of plasma discharges and materials processing /</em></a></p>

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       <title>
    Materials science of thin films deposition and structure






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       <dc:identifier>ISBN:81-312-0279-8</dc:identifier>
        
        <link>http://catalogue.nust.edu.pk:8081/cgi-bin/koha/opac-detail.pl?biblionumber=570828</link>
        
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	   <p>By Ohring, Milton. 
	   NEW DELHI ACADEMIC PRESS 2006
                        . XIX,794 P
                        
                        
                         81-312-0279-8
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