NUST Institutions Library Catalogue catalog › Results of search for 'ccl=(su:"Thin films") AND (su:"Surfaces.")'

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		Wafer Level 3-D ICs Process Technology (E-BOOK) [Elektronisk resurs] / edited by Chuan Seng Tan, Ronald J. Gutmann, L. Rafael Reif. by Tan, Chuan Seng \| Gutmann, Ronald J \| Reif, L. Rafael \| SpringerLink (Online service). Publisher: Boston, MA : Springer US, 2008Online access: Click here to access online \| Click here to access online \| Click here to access online \| Click here to access online \| Click here to access online \| Click here to access online \| Click here to access online \| Click here to access online \| Click here to access online \| Click here to access online Availability: Items available for loan: Military College of Signals (MCS)Call number: 621.381 TAN (1). Place hold Find in NUST Repository
		Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg. by Lieberman, M. A. (Michael A.) \| Lichtenberg, Allan J. Edition: 2nd ed.Material type: Text; Format: print ; Literary form: Not fiction Publisher: Hoboken, N.J. : Wiley-Interscience, c2005Dissertation note: . Online access: Contributor biographical information \| Publisher description \| Table of contents only Availability: Items available for loan: US-Pakistan Center for Advanced Studies in Energy (USPCAS-E)Call number: 530.44 LIE-P 2005 (3). Place hold Find in NUST Repository
		Materials science of thin films deposition and structure by Ohring, Milton. Edition: 2NDMaterial type: Text; Format: print ; Literary form: Not fiction Publisher: NEW DELHI ACADEMIC PRESS 2006Availability: Items available for loan: College of Electrical & Mechanical Engineering (CEME)Call number: 621.38152 OHR (1). Place hold Find in NUST Repository

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