| 000 | 01577cam a2200385 a 4500 | ||
|---|---|---|---|
| 001 | 13749338 | ||
| 003 | USPCAS-E | ||
| 005 | 20180118181421.0 | ||
| 008 | 041013s2005 njua b 001 0 eng | ||
| 010 | _a 2004058503 | ||
| 020 | _a0471720011 | ||
| 035 | _a(OCoLC)ocm56752658 | ||
| 040 |
_aDLC _cDLC _dIAY _dC#P _dOCL _dIXA _dBAKER _dDLC |
||
| 050 | 0 | 0 |
_aQC718.5.D9 _bL54 2005 |
| 082 | 0 | 0 |
_a530.44 _222 _bLIE-P 2005 |
| 100 | 1 |
_aLieberman, M. A. _q(Michael A.) |
|
| 245 | 1 | 0 |
_aPrinciples of plasma discharges and materials processing / _cMichael A. Lieberman, Allan J. Lichtenberg. |
| 250 | _a2nd ed. | ||
| 260 |
_aHoboken, N.J. : _bWiley-Interscience, _cc2005. |
||
| 300 |
_axxxv, 757 p. : _bill. ; _c25 cm. |
||
| 502 | _a. | ||
| 504 | _aIncludes bibliographical references (p. 735-748) and index. | ||
| 650 | 0 | _aPlasma dynamics. | |
| 650 | 0 |
_aThin films _xSurfaces. |
|
| 650 | 0 | _aPlasma etching. | |
| 650 | 0 |
_aPlasma chemistry _xIndustrial applications. |
|
| 700 | 1 | _aLichtenberg, Allan J. | |
| 856 | 4 | 2 |
_3Contributor biographical information _uhttp://www.loc.gov/catdir/enhancements/fy0618/2004058503-b.html |
| 856 | 4 | 2 |
_3Publisher description _uhttp://www.loc.gov/catdir/enhancements/fy0618/2004058503-d.html |
| 856 | 4 | 1 |
_3Table of contents only _uhttp://www.loc.gov/catdir/enhancements/fy0618/2004058503-t.html |
| 906 |
_a7 _bcbc _corignew _d1 _eocip _f20 _gy-gencatlg |
||
| 942 |
_2ddc _cBK |
||
| 999 |
_c356039 _d356039 |
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